Enhancing electrical performance and stability of nanometer-thin ITO transistors via thermally oxidized alumina passivation layer

نویسندگان

چکیده

In this study, we investigated the utilization of alumina (AlOx), formed through oxidation thermally evaporated aluminum, as a passivation layer for nanometer-thin indium-tin-oxide (ITO) transistors. The ITO transistors passivated with oxidized AlOx exhibited remarkable electrical properties, an average field-effect mobility 241 cm2/Vs, significantly higher than 40 cm2/Vs observed devices without layer. Moreover, maintained high on/off current ratio at 108 level. addition, demonstrated improved stability, decrease in threshold voltage (Vth) shift under negative bias stress testing conducted over 3600 seconds. also displayed better air-ambient stability compared to These results demonstrate potential application

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ژورنال

عنوان ژورنال: AIP Advances

سال: 2023

ISSN: ['2158-3226']

DOI: https://doi.org/10.1063/5.0148763